Quintus 的现代化 HIP 设备可在高达 2000⁰C (3632⁰F) 的温度和 200MPa (30,000 psi) 压力下工作。针对材料选择参数,通常,增加压力可以降低采用的温度,材料的微观结构保持不变。当然,选用的 HIP 周期不得超过待处理材料的熔化温度。
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